AUSTIN, Texas — Motorola researchers said they are on track to develop the masks needed for extreme ultraviolet (EUV) lithography, which is expected to enter manufacturing at the 50-nanometer ...

Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

The critical role of EUV pellicles: These thin membranes protect photomasks from contaminants, reducing defect rates and ensuring flawless chip production. The limitations of traditional materials: ...

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

(Nanowerk News) Recently, researchers from the Shanghai Institute of Optics and Fine Mechanics (SIOM) of the Chinese Academy of Sciences (CAS) have proposed a source mask optimization (SMO) technique ...

Researchers review AI-powered inverse lithography, showing how deep learning boosts chip patterning precision and efficiency while facing scaling challenges. Computational lithography optimizes the ...

“Full-chip curvilinear inverse lithography technology (ILT) requires mask writers to write full reticle curvilinear mask patterns in a reasonable write time. We jointly study and present the benefits ...

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

Fig. 1 The lithography process. The projection lithography system. The advancement of semiconductor manufacturing is a key driver of electronic device innovations. As Moore’s Law progresses, ...