Well-defined cylindrical and cuboidal silicon micropillar arrays arranged in square, rectangular and hexagonal patterns were fabricated using standard contact photolithography and deep-reactive ion ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Researchers at Aalto University have shown that a nanoparticle suspension can serve as a simple model for studying the formation of patterns and structures in more complicated non-equilibrium systems, ...